Preparation ,Electrical and Optical Properties of NiO Thin Film by Reactive Magnetron Sputtering

碩士 === 明志科技大學 === 材料工程系碩士班 === 102 === In this study, the NiO films with p-type conduction have been achieved by Three Dimensional Physical Vapor Deposition (3D-PVD) system using reactive magnetron sputtering. The optoelectronic properties of NiO films can be improved by changing the process paramet...

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Bibliographic Details
Main Authors: Hsu, Shih-Wen, 許世文
Other Authors: Chen, Sheng-Chi
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/pyd364