Surface Characterization of Hydroxyapatite Sputtered Films Deposited from Sintered and Plasma-sprayed Targets
碩士 === 明志科技大學 === 機械工程系機械與機電工程碩士班 === 102 === This study conducted RF-sputtering process to deposit the HA films with three separate HA targets, which were manufactured in-lab via three different process types including cold pressing and sintering (CPS), hot isostatically pressing (HIP) and atmosphe...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64utwv |