Synthesis and characterization of zirconia films on air-based sputtering deposited ZrN/Si by plasma electrolytic oxidation

碩士 === 國立中興大學 === 材料科學與工程學系所 === 102 === Abstract This research is to make ZrO2 films on air-based sputtering deposited ZrN/Si substrates by plasma electrolytic oxidation. The films have porous characteristics which were formed by plasma electrolytic oxidation. The ZrN is conductive and biocompatibi...

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Bibliographic Details
Main Authors: Chuan-Han Hsiao, 蕭全熯
Other Authors: Fu-Hsing Lu
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/56467514993271845312