Semiconductor Mask Registration Improvement using Taguchi Method
碩士 === 國立成功大學 === 工程管理碩士在職專班 === 102 === To extend Moore’s law of semiconductor industry, photolithography constantly shrink critical dimension to increase integrated circuit density of each die. However, while semiconductor manufacturing is progressing to 40nm and below, the most important problem...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/74f983 |