Study of Reliability Properties for Porous LowDielectric Constant Materials
碩士 === 國立暨南國際大學 === 電機工程學系 === 102 === In this thesis, we studed the reliability properties for porous low-k. The research topics are : (1) Effect of irradiation time on the porous low-k. (2) Effect of thickness on dense and porous low-k. (3) Evaluate HfO2 film as pore-sealing and Cu barrier film fo...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/6nv564 |