Effect of Oxygen Plasma Treatment on Electrical and Reliability Characteristics of HfO2 Gate Dielectrics
碩士 === 國立暨南國際大學 === 電機工程學系 === 102 === In this thesis, we studied the effect of oxygen plasma treatment on electrical and reliability characteristics of HfO2 gate dielectrics. The research topics are：(1) Effect of the post-deposition oxygen treatment；(2) Effect of the surface pre-treatment；(3) Effec...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/44867661576165411049 |