Effect of Oxygen Plasma Treatment on Electrical and Reliability Characteristics of HfO2 Gate Dielectrics
碩士 === 國立暨南國際大學 === 電機工程學系 === 102 === In this thesis, we studied the effect of oxygen plasma treatment on electrical and reliability characteristics of HfO2 gate dielectrics. The research topics are:(1) Effect of the post-deposition oxygen treatment;(2) Effect of the surface pre-treatment;(3) Effec...
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2014
|
Online Access: | http://ndltd.ncl.edu.tw/handle/44867661576165411049 |