Treatment of Wastewater Containing H2O2 in Semiconductor Fabrication by Catalase Dosing
碩士 === 國立交通大學 === 工學院永續環境科技學程 === 102 === Among the processes for manufacturing semiconductors, the circuit multiproject CMP and wet-etching processes involve using a considerable amount of ultrapure water for cleansing wafers. During the cleansing and etching process, FPM、SPM、HPM and APM present in...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49635615822618467117 |