The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation

碩士 === 國立交通大學 === 材料科學與工程學系所 === 102 === As electronic devices become more functional and miniaturization, the microelectronic industry is facing a lot of challenges. The fabrication process is encountering many physical limitations. In order to keep up with Moore’s law, the 3D-IC packaging technolo...

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Main Authors: Lin, Yu-Lung, 林玉龍
Other Authors: Chen, Chih
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/80963185072561693058
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spelling ndltd-TW-102NCTU51590152016-07-02T04:20:29Z http://ndltd.ncl.edu.tw/handle/80963185072561693058 The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation 在通電時錫晶粒方向與錫晶界對Cu6Sn5生成之影響 Lin, Yu-Lung 林玉龍 碩士 國立交通大學 材料科學與工程學系所 102 As electronic devices become more functional and miniaturization, the microelectronic industry is facing a lot of challenges. The fabrication process is encountering many physical limitations. In order to keep up with Moore’s law, the 3D-IC packaging technology is a promising solution to the limitatons. Microbumps are one of the possible solutions for 3D-IC packaging. The bump diameter shrinks to 20μm and the bump height decreases to about 10-15μm . As a result, the number of solder grains in a microbump is limited, and these few grains may affect the reliability of microbumps. It is well known that the diffusion is the key factor for intermetallic compounds (IMCs) formation, void formation and electromigration (EM). Previous researches reported that the diffusion of Ni in solder is highly anisotropic. The different Sn grain orientations can cause different failure modes for solder joints with Ni under bump metallization (UBM) during current stressing. Therefore, the Sn grain orientation is a critical problem for the reliability of 3D IC microbumps. However, no researches reported the anisotropic diffusion of Cu in solder under EM. In this study, we used flip-chip samples with 30μm bump height to study the Sn grain orientation effect on Cu diffusion by Electron Backscatter Diffraction (EBSD). The stressing condition was 1.17 x 10P4P A/cmP2 Pat 140 PoPC. Even though the anisotropy of Cu in Sn is not as large as Ni in Sn, the effect of Sn grain orientation on Cu-Sn IMC formation was still obvious. If the c-axis of Sn grain was aligned with along electron flow, the IMCs and the Cu UBM dissolved quickly at cathode side and the IMCs accumulated at anode side. Even when the channels of scallop CuR6RSnR5R closed, this phenomenon was unchanged. But if the c-axis of Sn grain was normal to electron flow, the CuR6RSnR5R formed along Sn grain boundary and the growth rate depended on the angle of grain boundary. Therefore, the Sn grain boundary also played an important role in the IMCs formation besides the Sn grain orientation. Chen, Chih 陳智 2013 學位論文 ; thesis 57 zh-TW
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description 碩士 === 國立交通大學 === 材料科學與工程學系所 === 102 === As electronic devices become more functional and miniaturization, the microelectronic industry is facing a lot of challenges. The fabrication process is encountering many physical limitations. In order to keep up with Moore’s law, the 3D-IC packaging technology is a promising solution to the limitatons. Microbumps are one of the possible solutions for 3D-IC packaging. The bump diameter shrinks to 20μm and the bump height decreases to about 10-15μm . As a result, the number of solder grains in a microbump is limited, and these few grains may affect the reliability of microbumps. It is well known that the diffusion is the key factor for intermetallic compounds (IMCs) formation, void formation and electromigration (EM). Previous researches reported that the diffusion of Ni in solder is highly anisotropic. The different Sn grain orientations can cause different failure modes for solder joints with Ni under bump metallization (UBM) during current stressing. Therefore, the Sn grain orientation is a critical problem for the reliability of 3D IC microbumps. However, no researches reported the anisotropic diffusion of Cu in solder under EM. In this study, we used flip-chip samples with 30μm bump height to study the Sn grain orientation effect on Cu diffusion by Electron Backscatter Diffraction (EBSD). The stressing condition was 1.17 x 10P4P A/cmP2 Pat 140 PoPC. Even though the anisotropy of Cu in Sn is not as large as Ni in Sn, the effect of Sn grain orientation on Cu-Sn IMC formation was still obvious. If the c-axis of Sn grain was aligned with along electron flow, the IMCs and the Cu UBM dissolved quickly at cathode side and the IMCs accumulated at anode side. Even when the channels of scallop CuR6RSnR5R closed, this phenomenon was unchanged. But if the c-axis of Sn grain was normal to electron flow, the CuR6RSnR5R formed along Sn grain boundary and the growth rate depended on the angle of grain boundary. Therefore, the Sn grain boundary also played an important role in the IMCs formation besides the Sn grain orientation.
author2 Chen, Chih
author_facet Chen, Chih
Lin, Yu-Lung
林玉龍
author Lin, Yu-Lung
林玉龍
spellingShingle Lin, Yu-Lung
林玉龍
The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation
author_sort Lin, Yu-Lung
title The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation
title_short The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation
title_full The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation
title_fullStr The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation
title_full_unstemmed The Effect of Tin Grain Orientations and Grain Boundaries during Current Stressing on Cu6Sn5 Formation
title_sort effect of tin grain orientations and grain boundaries during current stressing on cu6sn5 formation
publishDate 2013
url http://ndltd.ncl.edu.tw/handle/80963185072561693058
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