An Accurate and Efficient Procedure for Schottky Barrier Height Extraction
碩士 === 國立交通大學 === 電子研究所 === 102 === As the scaling of the semiconductor fabrication process, the contact resistance in semiconductor devices becomes larger due to the smaller contact area, and the total driving current is degraded. How to reduce the contact resistance is an urgent issue for the cont...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60094448324726378077 |