Research on the surface of silicon epitaxial process of particle pollution reduction
碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 102 === Among semiconductor fabrication of Si devices, epitaxy is one of the most critical processes. After many years of development of the epitaxial (EPI) process of semiconductors, production conditions gradually stabilized in recent years. Due to the shrinka...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20544781842339860986 |