Fast Programming Metal-Gate Silicon Quantum Dot Nonvolatile Memory

碩士 === 國立交通大學 === 顯示科技研究所 === 102 === In this thesis, the green nanosecond laser spike annealing (GN-LSA) was employed to fabricate the poly-Si channel and source/drain activation of thin film transistor (TFT). The GN-LSA can transfer a-Si into poly-Si with large grain (1000 nm). Moreover, the chemi...

Full description

Bibliographic Details
Main Authors: Wang, Chieh, 王傑
Other Authors: Lai, Yin-Chieh
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/22421814697301712218