Room temperature ferromagnetism of TiOx thin films by thermal annealing of sputtered Ti films
碩士 === 國立東華大學 === 材料科學與工程學系 === 102 === In this research, a series of Ti thin films of 30-120 nm in thickness sputtering a Ti target(99.995%) in an Ar plasma were deposited by using a DC magnetron sputtering system. The Ti thin films on silicon substrate were annealed first in air at 300℃ and then a...
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| Format: | Others |
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2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/n5c23u |