A Study of The Effects of Electrochemical Deposition Parameters on Cuprous Oxide Thin Film
碩士 === 國立高雄第一科技大學 === 電機工程研究所碩士班 === 102 === Both constant current and voltage electrodeposition are adopted to deposit the cuprous oxide thin films on both copper foil and ITO glass substrates. Using Taguchi method, either constant current or voltage, pH value, deposition time, and electrolyte tem...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05255392457856253402 |