Study on characteristics and Reliability on N/P-Type FinFET Devices

碩士 === 國立高雄師範大學 === 電子工程學系 === 102 === In thin work, Negative Bias Temperature Instability (NBTI), Positive Bias Temperature Instability (PBTI) and Hot Carrier Effect (HCE) were used to study the reliability of FinFET devices. Power law analyze was used to analysis the degradations of devices. NBTI...

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Bibliographic Details
Main Authors: Tzu-Sung Yen, 嚴子松
Other Authors: Yi-Lin Yang
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/78347153883008880032