Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Films for Photovoltaic Application – Experimental study and Simulation Analysis
碩士 === 國立清華大學 === 工程與系統科學系 === 102 === The purpose of this study is to investigate the influence of the plasma property on the thin film property in plasma enhanced chemical vapor deposition (PECVD) processes which are employed for deposition of silicon based thin film. This study includes both expe...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71642618168897533740 |