Atomic layer deposition of aliphatic polyamides films
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 102 === We studied the atomic layer deposition (ALD) processes of two polyamide films and their applications in flexible gas-permeation barriers. The two polyamides were: (1) poly-N-(2-aminoethyl)-3-oxopropanamide (PA32), deposited from malonyl chloride and ethylene...
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| Format: | Others |
| Language: | en_US |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20416478785118944620 |