Study of the Characteristic of the Stress Induced by Through-Silicon Via and the Stress Constraint/Modulation Structure

碩士 === 國立臺灣大學 === 機械工程學研究所 === 102 === In this work, numerical simulation was used to predict the thermal stress and keep-out zone defined as where carrier mobility changes too much for the devices to turn on. By considering the anisotropic characteristics of the silicon, it is thought that the angl...

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Bibliographic Details
Main Authors: Ssu-Chieh Kao, 高思介
Other Authors: 廖洺漢
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/19431227943297243566