Study of the Characteristic of the Stress Induced by Through-Silicon Via and the Stress Constraint/Modulation Structure
碩士 === 國立臺灣大學 === 機械工程學研究所 === 102 === In this work, numerical simulation was used to predict the thermal stress and keep-out zone defined as where carrier mobility changes too much for the devices to turn on. By considering the anisotropic characteristics of the silicon, it is thought that the angl...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2014
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Online Access: | http://ndltd.ncl.edu.tw/handle/19431227943297243566 |