Study and Fabrication of CaLa4(Zr0.05Ti0.95)4O15 Dielectric Thin Films by Using RF Magnetron Sputtering Method
碩士 === 國立聯合大學 === 電機工程學系碩士班 === 102 === In this article, CaLa4(Zr0.05Ti0.95)4O15 thin films with an annealing temperature of 900oC for 1 hour were prepared by rf magnetron sputtering at fixed operating pressure of 3 mTorr and sputtering time of 30 min with different RF powers (100~300W), substrate t...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/42482182140222202463 |