Nano Imprint Lithography and GaN GAA Nanowire
碩士 === 亞洲大學 === 資訊工程學系 === 102 === Nanoimprint Lithography: Si master molds are generally patterned by electron-beam lithography (EBL) that is known to be a time consuming nano patterning technique. Thus, developing mold duplication process based on high throughput technique such as nanoimprint lith...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2014
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/xqm526 |