Influences of the Deposition Parameters on the Properties of Aluminum Nitride thin film by the High Power Impulse Magnetron sputtering
碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 102 === In this work, aluminium nitride (AlN) thin films were fabricated using the high power impulse magnetron sputtering (HIPIMS) process through the Taguchi method to determine the optimum deposition condition. A L9 array, signal-to-noise (S/N) ratio, and analys...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/63r446 |