The Electrical and Optical Properties of Zn1−xMgxO Film Prepared by Radio Frequency Magnetron Sputtering
碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 102 === The Zn0.86Mg0.10Al0.04O films with 300 nm thickness were deposited onto Corning Eagle 2000 glass substrates by sputtering Zn0.82Mg0.14Al0.04O target using rf magnetron sputtering with various substrate temperature. The electric resistivity (ρ) of Zn0.86Mg0....
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/6arp44 |