RESEARCH OPTIMIZED PROCESS CONDITIONSOF TFT- LCD ITO ETCHING EQUIPMENT
碩士 === 元智大學 === 機械工程學系 === 102 === The relationship between etching of time、etchingwork temp and etching of concentration the influence of etching parameter. The purpose of this study is to decrease the waste discharge of ITO etchant, by this , we can decrease the environment pollution and decrease...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/37bp98 |