微接觸印刷取代曝光顯影製程可行性探討
碩士 === 國立中正大學 === 機械工程學系暨研究所 === 103 === This paper focuses on the micro-contact printing to replace photolithography. Exposure process is more expensive and time-consuming in photolithography. In this paper, we use the micro-contact printing technology and wetting gradient principle to generate the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/89083955579519340675 |