Accurate E-beam Correction System
碩士 === 國立高雄應用科技大學 === 電子工程系碩士班 === 103 === Currently semiconductor manufacturing process is able to reach 22 nm - 28 nm, even less than 20 nm. In such a sophisticated process to detect Wafer testing machine, it is a big challenge to the market. Besides well-known optical inspection machine, E-beam...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/15755521013740481480 |