Flow Field Analysis of Chemical Vapor Deposition Reactor with Showerhead Module
碩士 === 國立高雄應用科技大學 === 機械與精密工程研究所 === 103 === In the semiconductor manufacturing process of chemical vapor deposition (Chemical Vapor Deposition, CVD) system, the gas storage tank at atmospheric pressure or high pressure gas supply and pressure of the reaction chamber is usually lower than the atmo...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/z893ab |