Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers

碩士 === 國立中央大學 === 電機工程學系 === 103 === Silicon and germanium are the best semiconductor material choices for the integrated circuit for their material robustness and the fabrication process compatibility. Therefore, placement of SiGe thermoelectric microcoolers into integrated circuits to cool local h...

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Main Authors: Cheng-Syu Jhou, 周城旭
Other Authors: Pei-Wen Li
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/42609737992501356712
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spelling ndltd-TW-103NCU054420952016-08-17T04:23:15Z http://ndltd.ncl.edu.tw/handle/42609737992501356712 Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers CMOS製程相容之複晶矽鍺微致冷元件製作與特性探討 Cheng-Syu Jhou 周城旭 碩士 國立中央大學 電機工程學系 103 Silicon and germanium are the best semiconductor material choices for the integrated circuit for their material robustness and the fabrication process compatibility. Therefore, placement of SiGe thermoelectric microcoolers into integrated circuits to cool local hot spots is one of the promising, optimal solution to solve the heat problem in the future. Our research group has fabricated and explored the characteristics of thermal conductivity and electrical conductivity for 100 nm-wide poly-SiGe-pillars-array. Extensive experimental results show that 100 nm-wide, poly-SiGe nanopillars array with the Ge mole concentration of 24% possess, the estimated thermoelectric figure of merit (ZT) to up to 0.5 at 300 K. In this thesis, we have fabricated poly-Si and poly-Si0.76Ge0.24 P-N pillars (diameter of 250 nm/ height of 1 μm) arrays with various of area size in 17 × 12 μm2, 37 × 32 μm2 and 56 × 52 μm2. P-N pillars were produced by ion implantation of Boron/1 × 1020 cm-3 as P-dopants and Phosphorus/1 × 1020 cm-3 for N-type donors, respectively. Following nickel evaporation and silicidation and rapid-thermal annealing, NiSi/NiSiGe nanocontacts were produced to connect the bottom of N- and P-pillars. Also aluminum top electrodes form by thermal evaporation of aluminum in conjunction with lift-off process were formed to bridge the top of pillars, the P-/N- pair SiGe nanopillar thermoelectric microcooler. We systematically investigated effects of the array size and Ge concentration of poly-SiGe nanopillars on cooling capability at test conditions of the environmental temperature at 30, 60 and 90 oC as well as the driving current of 1, 3, 5, 7, 9 and 11 μA, respectively. Experimental results suggest that the poly-Si0.76Ge0.24 thermoelectric cooler with areas size of 37 × 32 µm2 possesses the best of the cooling capability with cooling temperature up to 15 oC for the condition of environmental temperature at 90 oC, and driving current at 11 μA. Pei-Wen Li Ming-Ting Kuo 李佩雯 郭明庭 2015 學位論文 ; thesis 95 zh-TW
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language zh-TW
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description 碩士 === 國立中央大學 === 電機工程學系 === 103 === Silicon and germanium are the best semiconductor material choices for the integrated circuit for their material robustness and the fabrication process compatibility. Therefore, placement of SiGe thermoelectric microcoolers into integrated circuits to cool local hot spots is one of the promising, optimal solution to solve the heat problem in the future. Our research group has fabricated and explored the characteristics of thermal conductivity and electrical conductivity for 100 nm-wide poly-SiGe-pillars-array. Extensive experimental results show that 100 nm-wide, poly-SiGe nanopillars array with the Ge mole concentration of 24% possess, the estimated thermoelectric figure of merit (ZT) to up to 0.5 at 300 K. In this thesis, we have fabricated poly-Si and poly-Si0.76Ge0.24 P-N pillars (diameter of 250 nm/ height of 1 μm) arrays with various of area size in 17 × 12 μm2, 37 × 32 μm2 and 56 × 52 μm2. P-N pillars were produced by ion implantation of Boron/1 × 1020 cm-3 as P-dopants and Phosphorus/1 × 1020 cm-3 for N-type donors, respectively. Following nickel evaporation and silicidation and rapid-thermal annealing, NiSi/NiSiGe nanocontacts were produced to connect the bottom of N- and P-pillars. Also aluminum top electrodes form by thermal evaporation of aluminum in conjunction with lift-off process were formed to bridge the top of pillars, the P-/N- pair SiGe nanopillar thermoelectric microcooler. We systematically investigated effects of the array size and Ge concentration of poly-SiGe nanopillars on cooling capability at test conditions of the environmental temperature at 30, 60 and 90 oC as well as the driving current of 1, 3, 5, 7, 9 and 11 μA, respectively. Experimental results suggest that the poly-Si0.76Ge0.24 thermoelectric cooler with areas size of 37 × 32 µm2 possesses the best of the cooling capability with cooling temperature up to 15 oC for the condition of environmental temperature at 90 oC, and driving current at 11 μA.
author2 Pei-Wen Li
author_facet Pei-Wen Li
Cheng-Syu Jhou
周城旭
author Cheng-Syu Jhou
周城旭
spellingShingle Cheng-Syu Jhou
周城旭
Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers
author_sort Cheng-Syu Jhou
title Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers
title_short Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers
title_full Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers
title_fullStr Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers
title_full_unstemmed Fabrication and Characterization of CMOS Compatible Poly-Si/SiGe Thermoelectric Microcoolers
title_sort fabrication and characterization of cmos compatible poly-si/sige thermoelectric microcoolers
publishDate 2015
url http://ndltd.ncl.edu.tw/handle/42609737992501356712
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