Optimization of silicon and oxygen flux and oxidation temperature on Ge-nanoball/SiO2/SiGe gate-stacking heterostructure
碩士 === 國立中央大學 === 電機工程學系 === 103 === We demonstrated a unique approach to generate self-organized, self-alignment, and low-cost Ge-nanoball/SiO2/SiGe-shell gate-stacking heterostructures through the selective oxidation of poly-Si0.83Ge0.17 nano-pillars over the Si3N4 buffer layer on the Si substrate...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2015
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Online Access: | http://ndltd.ncl.edu.tw/handle/75218553670310600596 |