The Light-Passivation Effect of the 633 nm He-Ne Laser in the Electrochemical Etching Process
碩士 === 國立中央大學 === 光機電工程研究所 === 103 === In the 1985, scientist Uhlir firstly discovered the layer with porous when he working electrolytic polishing on the surface of silicon substrate. The process of the porous surface on P-type silicon relied on the electrochemical methods such as the conformation...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/99658894559082800984 |