Reactive co-sputtered boron doped titania thin films as a photocatalyst.

碩士 === 國立東華大學 === 材料科學與工程學系 === 103 === In this study, two series of pure and boron-doped titania thin films were prepared in a reactive magnetron sputtering system by co-sputtering Ti and TiB2 targets in oxygen and argon plasma at 100 ℃. Subsequently the films were annealed at 600 ℃ in atmosphere f...

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Bibliographic Details
Main Authors: Shi-Jie Shen, 沈士傑
Other Authors: Ming-Show Wong
Format: Others
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/53220980178009624739