An EUV Relocation Algorithm Based on Quadtrees
碩士 === 國立臺灣大學 === 電子工程學研究所 === 103 === In sub-10 nm node VLSI technologies, extreme ultraviolet lithography (EUV) is regarded as one of the promising technologies. However, when producing the EUV mask blanks, even tiny dirt fallen on blanks would finally cause blank''s surface roug...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66224000278474479672 |