An EUV Relocation Algorithm Based on Quadtrees

• Main Authors: Hou-Chun Lee, 李厚均
• Other Authors: Sy-Yen Kuo
• Format: Others
• Language: en_US
• Published: 2015
• Online Access: http://ndltd.ncl.edu.tw/handle/66224000278474479672

碩士 === 國立臺灣大學 === 電子工程學研究所 === 103 === In sub-10 nm node VLSI technologies, extreme ultraviolet lithography (EUV) is regarded as one of the promising technologies. However, when producing the EUV mask blanks, even tiny dirt fallen on blanks would finally cause blank''s surface rough, which are called defects. These defects would affect circuit correctness. Due to current technology limitations, there are no defect-free blanks by now. In order to achieve mass production, relocating layouts is commonly used to mitigate the problem. Although there are many works discussing this issue, it is still desirable to achieve better results for better solutions. In this thesis, we regard layouts and blanks as images and use quadtrees to model relative positions. Then, we encode image block locations by interleaving x and y coordinates in binary. This encoding method can fast access nodes in quadtrees and accelerates the overall EUV relocation algorithm. Compared with state-of-the art studies, our algorithm can achieve faster running time and better quality.