The Study of HfZnO Thin Film and Thin Film Transistor
博士 === 國立臺灣大學 === 應用力學研究所 === 103 === This thesis reports the properties of the HfxZn1-xO thin films deposited by rf-sputtering and sol-gel method. The sputter-deposited HfxZn1-xO thin films were then used as the active layers of thin film transistors (TFTs) on the glass substrates. The sputtering...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/03339234857014398090 |