Trim Mask Optimization for HybridMultiple Pattering Lithography
碩士 === 國立臺灣科技大學 === 電機工程系 === 103 === Due to the delay of next generation lithography technologies, multiple patterning lithography technologies are still regarded as one of the most promising solutions for sub-20nm technology nodes. In self-aligned multiple patterning lithography, the misalignment...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/22198748154865124721 |