Simulate of PECVD Chamber Clean Using Remote Plasma System

碩士 === 國立高雄大學 === 電機工程學系碩士班 === 103 === Thin film deposition is one of the most important processes in fabricating semiconductor devices. An automatic deposition system usually equiped with self-cleaning function; the system can clean a vacuum chamber after chemical reaction inside the chamber. Remo...

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Bibliographic Details
Main Authors: He-cheng Ji, 紀和成
Other Authors: Wen-Teng Chang
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/79153624133876664394