Coating process improvement in a sputtering system and its applications in copper-coating on transparent conductive film.
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 103 === In this paper, splashed against a horizontal cross design flaws and bottlenecks after the film output efficiency of laboratory equipment, and to transform the device and re-optimization process conditions. Divided into two parts which improve the level of d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/9h92an |