Characteristics of Low Temperature Supercritical Fluid Technique for the Zn2SiO4 Resistive Random Access Memory
碩士 === 南臺科技大學 === 電子工程系 === 103 === In this thesis, by the RF sputtering technique, the Zn2SiO4 thin films were deposited on the ITO/Glass substrate, and the Aluminum were vaporized on the films to form a metal/insulator/metal resistive random access memory structure. The physical and electric influ...
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| Format: | Others |
| Language: | zh-TW |
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| Online Access: | http://ndltd.ncl.edu.tw/handle/92105292267322272151 |