The study of GTZO thin films by DC magnetron sputtering
碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 103 === The GZO and GTZO thin films were deposited on glass substrates by direct-current (DC) magnetron sputtering system with GZO ceramic target made of 99.4 wt% ZnO and 0.6 wt% Ga2O3. The GTZO ceramic target made of 98.4 wt% ZnO, 0.6 wt% Ga2O3 and 1 wt% TiO2. Th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/eezrzu |