Hot-carrier and Its Recovery Effects on HK/MG PMOSFETs though Different Concentrations and Temperatures of Nitridation
碩士 === 國立臺北科技大學 === 機電整合研究所 === 103 === This thesis is about the research on channel hot carrier (CHC) effects of pMOSFETs, which have high dielectric material / metal gate (HK / MG) stack. Current researches indicate that the HK nitridation of dielectric layer after deposition can prevent crystalli...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Online Access: | http://ndltd.ncl.edu.tw/handle/krj6ag |