The Study of Cyclonic Atmospheric Plasma Deposition of SiOx Films And Reactive Gas Effects.
碩士 === 元智大學 === 化學工程與材料科學學系 === 103 === The aim of this study is to attempt to synthesize SiOx film by atmospheric pressure plasma chemical vapor deposition. The first part is to use Hexamethyldisilazane (HMDSN) forming SiOx films with various operational conditions such as RF plasma power level,...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/bfxqc6 |