Development of IGZO TFT by pulse-DC magnetron sputtering deposition for enhancing the device performance
碩士 === 元智大學 === 光電工程學系 === 103 === The benefits provided by pulse-DC sputtering were expected to improve thin-film structural, surface morphology, and the optoelectronic properties of a-IGZO thin films. However, the study of the device performances of a-IGZO TFTs fabricated by pulse-DC magnetron spu...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/hctdf7 |