Preparation of Organic and Inorganic Silicon-Based Thin Films Using High Plasma Deposition Monitored by Optical Emission Spectroscopy
碩士 === 大葉大學 === 電機工程學系 === 104 === In this study, an optical emission spectrometer (OES) is used to in-situ monitor the variation of plasma radical distribution during the deposition of organic/inorganic silicon thin films by using inductively coupled plasma chemical vapor deposition. For inorganic...
Main Authors: | Liao, Yi-Hang, 廖宜航 |
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Other Authors: | Lien, Shui-Yang |
Format: | Others |
Language: | zh-TW |
Published: |
2016
|
Online Access: | http://ndltd.ncl.edu.tw/handle/30022651992753096741 |
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