Characteristic Diagnosis and Investigation of a VHF Argon Plasma

碩士 === 逢甲大學 === 材料科學與工程學系 === 104 === A high density plasma with a large area has been required from Micro-electromechanical Systems (MEMS) as well as semiconductor industries. The development of the high density plasma of 15 inch in diameter for thin film deposition and etching treatment has partly...

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Bibliographic Details
Main Authors: Tsung-Ling Chou, 周宗玲
Other Authors: 陳家富
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/40932230080083321004