Effect of Hydrogen Plasma on SnOX Films
碩士 === 崑山科技大學 === 電機工程研究所 === 104 === This work reports improving the electrical properties of tin oxide films with hydrogen plasma. Tin oxide films were deposited with RF sputtering. After that,as-deposited tin oxide films were hydrogen plasma annealed with different powers between 300 and 700 W. T...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/84214526036621194143 |