Properties of CrSiN coatings fabricated by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and radio frequency (RF) sputtering
碩士 === 明志科技大學 === 材料工程系碩士班 === 104 === High power impulse magnetron sputtering (HIPIMS) already developed for more than 10 years. It is characterized by its ultra-high peak current and peak power density to obtain unique thin film properties, such as high hardness, good adhesion and tribological per...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19985625683330414592 |
| Summary: | 碩士 === 明志科技大學 === 材料工程系碩士班 === 104 === High power impulse magnetron sputtering (HIPIMS) already developed for more than 10 years. It is characterized by its ultra-high peak current and peak power density to obtain unique thin film properties, such as high hardness, good adhesion and tribological performance. However, its low deposition rate makes it hard to be applied in industries. In this work, CrSiN thin films were fabricated on Si wafer and AISI420 stainless steel substrates using a hybrid coating system containing a high power impulse magnetron sputtering (HIPIMS) unit and a radio frequency (RF) sputtering unit. Properties of the frequency and the duty cycle were adjusted to evaluate its effect of coating. The phase of each coating was studied by means of the X-ray diffractometer. The microstructures of thin films were examined by the field-emission scanning electron microscopy. The nanoindentation and scratch tests were used to evaluate the hardness and adhesion properties of thin films, respectively. It can be found that the deposition rate increased greatly from 7.9 to 11.5 nm/min due to the addition of RF power. The hardness of CrSiN coating increased from 18.2 to 31.5 GPa as the Si content increased from 1.0 to 14.2 at.%. A high hardness of 31.5 GPa and good adhesion were obtained for the CrSiN coating containing 14.2 at. % Si under a duty cycle of 2.5% and a frequency of 1000 Hz.
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