Investigation of performance improvement for III-V compound solar cells with nanomesh electrode and nanostructured antireflection coating
碩士 === 國立成功大學 === 微電子工程研究所 === 104 === In this study, the laser interference photolithography technique and oblique evaporation method by electron beam evaporation system were used to fabricate the nanomesh electrode and the TiO2 nanostructured as the antireflection coating on the InGaP/InGaAs/Ge co...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/27364113768845313947 |