Metal Contact Transfer Lithography for Anti-reflection Structure Fabrication on Planar and Curved Surface
碩士 === 國立成功大學 === 機械工程學系 === 104 === This paper fabricates anti-reflection nanostructures on planar and curved glass substrates based on contact transferred and masked embedded Lithography (CMEL). It utilizes UV-PDMS molds replicated from silicon molds to transfer metallic and patterned nano-disks t...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49567133134531296262 |