Study on Minimization of the Dry Etch Undercut for High Temperature Aluminum Process

碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 104 === To reduce the fabrication cost, we replaced the conventional tungsten plug process based on the design rule for 6-inch wafers with the aluminum plug process. The replacement of the plug material significantly changes the process characteristics of patter...

Full description

Bibliographic Details
Main Authors: Hsieh, Awei, 謝紹偉
Other Authors: Pan, Fu-Ming
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/p28t9y