Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method

碩士 === 國立高雄第一科技大學 === 電機工程研究所碩士在職專班 === 104 === A TFT-LCD array photo production line, including photoresist coating, exposure, and development processes, is key processes of producing TFT-LCD array. When a production line is stabilized, the machines, materials, and yields are stable. A challenge of...

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Main Authors: Chih-Chen Yen, 顏志丞
Other Authors: Haw-ching Yang
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/04556583160006751458
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spelling ndltd-TW-104NKIT54410032016-06-20T04:16:31Z http://ndltd.ncl.edu.tw/handle/04556583160006751458 Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method 提升TFT-LCD Array Photo產線產能之系統模擬方法 Chih-Chen Yen 顏志丞 碩士 國立高雄第一科技大學 電機工程研究所碩士在職專班 104 A TFT-LCD array photo production line, including photoresist coating, exposure, and development processes, is key processes of producing TFT-LCD array. When a production line is stabilized, the machines, materials, and yields are stable. A challenge of a line manager is how to effectively improve machines efficiency for maximizing line capacity while maintaining conditions of process hardware The typical bottleneck of a TFT-LCD array photo production line is the exposure process. When a non-scheduled down occurs in the exposure process, the following development process could be idle for waiting sheets, so that the line capacity is reduced. Therefore, based on system simulation method, this study. adopts a simulation tools "Flexsim" to build a line model according to production flows, cycle times, and distributions of non-scheduled downtimes of an actual production line., Efficiency of production line can be accessed by tuning various production modes, such as material input mode and buffer size of development process, using the built line model. After simulating a TFT-LCD array photo line, this study explores that the line capacity can be improved by tuning buffer size according to non-scheduled downtime and input mode. The minimum buffer size 30 is necessary even with few non-scheduled downtimes; however, the buffer size exceeding 45 fails to improve line capacity when massive non-scheduled downtimes occurred. In addition, comparing to current 6000 sheets/week with fixed buffer size 30 and input mode, the proposed dynamic buffer size modified per 200 sheets and input mode can increase line capacity 3.2% ~ 7.4% while average sheet reworking ratio 0.26% ~ 0.84% in the blocking area of the development process. Haw-ching Yang 楊浩青 2016 學位論文 ; thesis 70 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立高雄第一科技大學 === 電機工程研究所碩士在職專班 === 104 === A TFT-LCD array photo production line, including photoresist coating, exposure, and development processes, is key processes of producing TFT-LCD array. When a production line is stabilized, the machines, materials, and yields are stable. A challenge of a line manager is how to effectively improve machines efficiency for maximizing line capacity while maintaining conditions of process hardware The typical bottleneck of a TFT-LCD array photo production line is the exposure process. When a non-scheduled down occurs in the exposure process, the following development process could be idle for waiting sheets, so that the line capacity is reduced. Therefore, based on system simulation method, this study. adopts a simulation tools "Flexsim" to build a line model according to production flows, cycle times, and distributions of non-scheduled downtimes of an actual production line., Efficiency of production line can be accessed by tuning various production modes, such as material input mode and buffer size of development process, using the built line model. After simulating a TFT-LCD array photo line, this study explores that the line capacity can be improved by tuning buffer size according to non-scheduled downtime and input mode. The minimum buffer size 30 is necessary even with few non-scheduled downtimes; however, the buffer size exceeding 45 fails to improve line capacity when massive non-scheduled downtimes occurred. In addition, comparing to current 6000 sheets/week with fixed buffer size 30 and input mode, the proposed dynamic buffer size modified per 200 sheets and input mode can increase line capacity 3.2% ~ 7.4% while average sheet reworking ratio 0.26% ~ 0.84% in the blocking area of the development process.
author2 Haw-ching Yang
author_facet Haw-ching Yang
Chih-Chen Yen
顏志丞
author Chih-Chen Yen
顏志丞
spellingShingle Chih-Chen Yen
顏志丞
Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method
author_sort Chih-Chen Yen
title Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method
title_short Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method
title_full Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method
title_fullStr Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method
title_full_unstemmed Improve Capability of TFT-LCD Array Photo Production Line by using System Simulation Method
title_sort improve capability of tft-lcd array photo production line by using system simulation method
publishDate 2016
url http://ndltd.ncl.edu.tw/handle/04556583160006751458
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AT yánzhìchéng tíshēngtftlcdarrayphotochǎnxiànchǎnnéngzhīxìtǒngmónǐfāngfǎ
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