Analysis of Residual Stress Distribution in ITO Thin Film Coated on Si-Substrate by Applying DIC Technique and Taguchi Method
碩士 === 國立中山大學 === 機械與機電工程學系研究所 === 104 === In the MEMS process, a thin film is likely to be coated on a substrate. Residual stress is established in the coating upon cooling to room temperature because thermal expansion coefficients of the thin film and the substrate are different. The residual stre...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05724555839549415375 |