Development of Thermal Plate-assisted Chemical Vapor Deposition for Growth of High-quality Graphene
碩士 === 國立清華大學 === 物理系 === 104 === In this work, we develop a new chemical vapor deposition system called the thermal plate-assisted chemical vapor deposition (TPACVD) in our laboratory. This system combine the chemical vapor deposition technique with the thermal plate-assisted installation. Through...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/29118479541323890880 |